Job Description

Overview

Location: Fab10N Singapore

Department: Process Development – Singapore (Photolithography)

Project title: Edge Placement Error Modeling and Optimization

Project Description: Develop and optimize models for overlay and critical dimension uniformity improvement. Project scope: Introduction to photolithography for semiconductor patterning and control.

Deliverables
  • Develop and deploy edge placement error model for photolithography
Skillset Required
  • Mathematical modeling and numerical analysis with programming knowledge (preferred)
  • Characterization techniques: SEM, optical imaging
Course Of Interest
  • Semiconductor Manufacturing
  • Nanomaterials
  • Physics
  • Mathematical modeling
  • Programming
Duration

4-6 months (minimum 4 months)

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